Saturday, June 12, 2010

B Engineers turn the stickiness of gold nanoparticles into an advantage

B Free webinar on the use of atomic force microscopy to characterize biomaterials at the nanoscale

Wednesday, June 9, 2010

B Fwd: MEMS-talk Digest, Vol 92, Issue 7

---------- Forwarded message ----------
From: <>
Date: Jun 9, 2010 11:01 AM
Subject: MEMS-talk Digest, Vol 92, Issue 7
To: <>

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Today's Topics:

  1. Re: CF4 : O2 RIE of silicon, variability (Daniel Lloyd)
  2. Re: DRIE Simulator (javad sharifi)
  3. Re: CF4 : O2 RIE of silicon, variability (Jie Zou)

---------- Forwarded message ----------
From: "Daniel Lloyd" <>
To: "General MEMS discussion" <>, "" <>
Date: Tue, 08 Jun 2010 20:52:38 +0100
Subject: Re: [mems-talk] CF4 : O2 RIE of silicon, variability
Hi K.C,

Do you mean at various points on one sample or between different samples? I've found in the past that due to edge/loading effects the etch rates (and particularly selectivity's) can vary across a sample. In these instances its often apparent as a series of rings on the surface of different surface finishes. I have managed to minimise this by using recessed platens but I'm sure there are better ways- particularly on thinner wafers.


-----Original Message-----
From: l j []
Sent: 08 June 2010 00:13
Subject: [mems-talk] CF4 : O2 RIE of silicon, variability

Hello all,
I see great variablity in etch rate of silicon with RIE CF4:O2 etch.
At one point I see etch rate of >1um/min, at other <0.1um/min. This is at same proces parameter setting (1:12 O2:CF4 ratio, 0.2T, 500W).
Can anyone comment on what might casue such wide variability in etch rate at nominally constant process parameters?
Thanks in advance,

---------- Forwarded message ----------
From: javad sharifi <>
To: General MEMS discussion <>
Date: Wed, 9 Jun 2010 01:42:25 +0430
Subject: Re: [mems-talk] DRIE Simulator
hi all, i need a simulator for mems.....can you introduce me ?

On 6/8/10, antwi nimo <> wrote:
> Suprem.
> Suprem will not give you DRIE per say but etching in general. I dont know if
> there is a specific simulation tool to deal with DRIE exclusive to etching
> in general.
> My experience is that SUPREM works just fine for simulating etching mems
> materials.
> regards,
> Nimo

---------- Forwarded message ----------
From: Jie Zou <>
To: General MEMS discussion <>
Date: Tue, 8 Jun 2010 21:08:38 -0400
Subject: Re: [mems-talk] CF4 : O2 RIE of silicon, variability
You may also want to check whether your surface has a thin layer of
native oxide.


On Mon, Jun 7, 2010 at 7:12 PM, l j <> wrote:
> Hello all,
> I see great variablity in etch rate of silicon with RIE CF4:O2 etch.
> At one point I see etch rate of >1um/min, at other <0.1um/min. This is at same proces parameter setting (1:12 O2:CF4 ratio, 0.2T, 500W).
> Can anyone comment on what might casue such wide variability in etch rate at nominally constant process parameters?
> Thanks in advance,
> K.C.

*  Zou Jie (Jay)
*  Department of Physics
*  University of Florida
*  Tel: +1-352-846-8018
*  Email:
*  Homepage:

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Tuesday, June 8, 2010

B Access : Spatiotemporal control of cell signalling using a light-switchable protein interaction : Nature

B Enzymatic assembly of DNA molecules up to several ... [Nat Methods. 2009] - PubMed result

B Fwd: MEMS Express from MNX

---------- Forwarded message ----------
From: "MEMS News" <>
Date: Jun 8, 2010 3:52 PM
Subject: MEMS Express from MNX
To: <>

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Apple Inc.'s iPhone 4, unveiled by the company today, is the world's first smart phone to sport a MEMS gyroscope, confirming earlier speculation. Look for every smartphone vendor to add a gyroscope their offerings by Christmas 2010. ...
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If tests prove that the force can be controlled, the outcome could alter the future of nanoelectromechanical systems (NEMS), drastically improving how they ...
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The secret, according to Harvard physicist David Weitz, lies in a technology known as microfluidics. It's pretty much exactly what it sounds like ...
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Event Calendar

Hilton Head Workshop 2010
Hilton Head Workshop 2010
2010-06-06 - 2010-06-10
Hilton Head Island, South Carolina
Thirteenth workshop on the science and technology of solid-state sensors, actuators, and microsystems.
Visit MNX at this event.

sensors expo & conference 2010
sensors expo & conference 2010
2010-06-07 - 2010-06-09
Rosemont, IL
Attend the Leading Forum on Sensing Technologies & Solutions in North America!
Visit MNX at Booth #316.

sensors expo & conference 2010: Thinking Outside the Chip
sensors expo & conference 2010: Thinking Outside the Chip
Rosemont, IL
MEMS-Based Solutions: Design, Tradeoffs and Applications - Moderator: Roger Grace

2010-06-14 - 2010-06-16
Bremen, Germany
12 International Conference of New Actuators & 6th International Exhibition on Smart Actuators and Drive Systems

Microtech Conference & Expo 2010
Microtech Conference & Expo 2010
2010-06-21 - 2010-06-25
Anaheim, California, USA
Bringing together the entire Microsystems ecosystem with the goal of accelerating the flow of technologies from development to implementation.
Visit MNX at Booth #857.

MEMS Education Series - MEMS Test and Reliability Short Course
MEMS Education Series - MEMS Test and Reliability Short Course
SF State University Downtown Campus, San Francisco, CA
MEMS test and reliability assessment methods--with particular attention to operational and financial issues.

2010-07-13 - 2010-07-15
San Francisco, California
The flagship annual event for the global microelectronics industry

COMS - The Commercialization of Micro and Nano Systems Conference
COMS - The Commercialization of Micro and Nano Systems Conference
2010-08-29 - 2010-09-02
Albuquerque, New Mexico, USA
The world's premier meeting place that brings together leaders from all over the world and every sector of the industry.
Visit MNX at this event.

IEEE Sensors 2010
IEEE Sensors 2010
2010-11-01 - 2010-11-04
Waikoloa Beach, Hawaii
The 9th Annual IEEE Conference on Sensors

MEMS Executive Congress 2010
MEMS Executive Congress 2010
2010-11-03 - 2010-11-05
InterContinental Montelucia, Scottsdale, AZ, USA
The 6th MEMS Industry Group (MIG) hosted event

2011-01-23 - 2011-01-27
Cancun, Mexico
The 24th International Conference on Micro Electro Mechanical Systems

Transducers' 11
Transducers' 11
2011-06-05 - 2011-06-09
Beijing, China
The 16th International Conference on Solid-State Sensors, Actuators and Microsystems

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Monday, June 7, 2010

B Technology Review: The $30 Genome?

B nanoscale coax

B Self-Assembling Nanoscale Fabric Obtained - Harvard researchers are behind the achievement - Softpedia

B Blog on Optical Tweezers: Observation of DNA pinning at laser focal point on Au surface and its application to single DNA nanowire and cross-wire formation

B Blog on Optical Tweezers: Assembly of Acircular SnO2 Rod Using Optical Tweezers and Laser Curing of Metal Nanoparticles

B New nanoscale electrical phenomenon discovered